HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION

HIGH CARBON CONTENT MOLECULES FOR AMORPHOUS CARBON DEPOSITION

The disclosure relates to a method of depositing amorphous carbon on a substrate using at least one carbon containing molecule having at least one carbon atom the method comprising the steps of supplying the carbon containing molecule and carrying out the deposition to thereby form a deposited amorp...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DUSSARRAT CHRISTIAN, OMARJEE VINCENT M
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The disclosure relates to a method of depositing amorphous carbon on a substrate using at least one carbon containing molecule having at least one carbon atom the method comprising the steps of supplying the carbon containing molecule and carrying out the deposition to thereby form a deposited amorphous carbon on the substrate, wherein a carbon to hydrogen ratio of the molecule is equal to or more than 0.7.