PLASMA EQUIPMENT AND METHODS OF USING THE SAME

PLASMA EQUIPMENT AND METHODS OF USING THE SAME

Plasma equipments are provided. The plasma equipment comprises a chamber in which a plasma reaction occurs, a detector outputting a spectrum signal in response to light generated from the plasma reaction, and a plasma monitoring module determining whether the spectrum signal includes an arcing signa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM YONGKYU, KIM BONGSUN, JEONG JAEHONG, NA MINJAE, JUN HYUN SU, PARK DOOBYEONG, LEE DONGBOCK, LEE DONGYOON
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Beschreibung
Zusammenfassung:Plasma equipments are provided. The plasma equipment comprises a chamber in which a plasma reaction occurs, a detector outputting a spectrum signal in response to light generated from the plasma reaction, and a plasma monitoring module determining whether the spectrum signal includes an arcing signal or a hunting signal. Related methods are also provided.