DIRECT LIQUID DEPOSITION

DIRECT LIQUID DEPOSITION

Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1'). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapour distribution nozzle arrangement...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GAECHTER BRUNO, VOSER STEPHAN, RAVELLI FABIO ANTONIO
Format: Patent
Sprache:eng
Schlagworte:
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
ATOMISING APPARATUS
NOZZLES
PERFORMING OPERATIONS
SPRAYING APPARATUS
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
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Beschreibung
Zusammenfassung:Liquid precursor material of a coating substance and a solvent is provided in a reservoir (STEP1, STEP1'). In one variant the liquid precursor material is distilled (STEP2), the resultant liquid coating substance is vaporized (STEP3) and ejected through a vapour distribution nozzle arrangement (7) into a vacuum recipient (3) and onto substrate 5 to be coated. Alternatively, the liquid precursor material is directly vaporized (STEP3'). From the two-component vapour coating substance vapour is applied to substrate 5' to be coated. In this variant separation of solvent vapour and coating substance vapour is performed especially downstream vaporizing (STEP2').