PROTECTIVE MATERIAL FOR GAS DELIVERY IN A PROCESSING SYSTEM

Apparatus and systems are disclosed for providing a protective material for a gas-delivery system of a processing system. In an embodiment, a processing system includes a processing chamber for processing substrates and a gas-delivery system for delivering processing gases to the processing chamber....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NGUYEN SON, OLGADO DONALD
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Apparatus and systems are disclosed for providing a protective material for a gas-delivery system of a processing system. In an embodiment, a processing system includes a processing chamber for processing substrates and a gas-delivery system for delivering processing gases to the processing chamber. The gas-delivery system includes a protective material to protect the gas-delivery system from processing gases including at least one processing gas heated to an elevated temperature. The protective material includes a tungsten plate or a tungsten plate coated with a tantalum alloy and tantalum