TECHNIQUES AND SYSTEMS FOR FABRICATING ANTI-REFLECTIVE AND PASSIVATION LAYERS ON SOLAR CELLS

The present invention is directed to techniques for fabricating solar cells that feature annealing of a substrate and subsequent formation of a combination passivation and antireflective layer in superimposition with a p-n junction formed on the substrate by introductions of impurities. It was determined that the time and cost for manufacture may be reduced by annealing the substrate before formation of the combination layer and maintaining the temperature proximate to the annealing temperature. To that end, upon completion of the anneal process the temperature of the substrate is maintained within an acceptable temperature range to reduce the time required for the substrate to reach temperature for formation of the combination layer. The combination layer is then formed without undue delay using plasma deposition processes.