METHOD OF PRODUCING POROUS VALVE METAL THIN FILM AND THIN FILM PRODUCED THEREBY

Provided are a porous valve metal thin film having a great surface area, a method for the production thereof, and a thin film capacitor having a great capacity density utilizing the thin film as an anode. The porous valve metal thin film is produced by preparing a thin film in which a valve metal an...

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Bibliographische Detailangaben
Hauptverfasser: OSAKO TOSHIYUKI, KOMUKAI TETSUFUMI
Format: Patent
Sprache:eng
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Zusammenfassung:Provided are a porous valve metal thin film having a great surface area, a method for the production thereof, and a thin film capacitor having a great capacity density utilizing the thin film as an anode. The porous valve metal thin film is produced by preparing a thin film in which a valve metal and a hetero-phase component have a particle diameter within a range of from 1 nm to 1 μm and the valve metal and the hetero-phase component are uniformly distributed, subjecting the thin film to a heat treatment so as to adjust the particle diameter and to appropriately sinter the film, and removing the hetero-phase portion.