Manufacturing Method for Color Filter Substrate, Photomask and Photoreactive Layer

A manufacturing method for a color filter substrate is disclosed in the present disclosure, which comprises the following steps of: providing a substrate; providing a photoreactive layer that covers the substrate; providing a photomask disposed above the photoreactive layer; and providing light rays...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LEE KUANNG, CHEN HSIAO HSIEN
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A manufacturing method for a color filter substrate is disclosed in the present disclosure, which comprises the following steps of: providing a substrate; providing a photoreactive layer that covers the substrate; providing a photomask disposed above the photoreactive layer; and providing light rays of different frequency bands for irradiating the photoreactive layer through the photomask so as to form color resist regions and black matrix regions on the photoreactive layer respectively. A photomask and a photoreactive layer for preparing a color resist layer on a color filter substrate are also provided in the present disclosure. Thereby, the present disclosure can advantageously shorten the production cycle, and improve the aperture ratio and the contrast ratio.