GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE

A group III nitride semiconductor light-emitting device includes a GaN crystal substrate and at least one group III nitride semiconductor layer disposed on a main surface of the GaN crystal substrate. The substrate includes a matrix crystal region and a c-axis-inverted crystal region. An off angle i...

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Hauptverfasser: NAKAHATA SEIJI, NAKANISHI FUMITAKE
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NAKANISHI FUMITAKE
description A group III nitride semiconductor light-emitting device includes a GaN crystal substrate and at least one group III nitride semiconductor layer disposed on a main surface of the GaN crystal substrate. The substrate includes a matrix crystal region and a c-axis-inverted crystal region. An off angle is formed between the main surface and a {0001} plane, and an off-angle component of a first direction has an absolute value | 1| of 0.03° or more and 1.1° or less and an off-angle component of a second direction has an absolute value | 2 of 0.75×| 1| or less, where the first direction is one of and directions and the second direction is the other thereof. Accordingly, the group III nitride semiconductor light-emitting device with excellent characteristics including the group III nitride semiconductor layer having good morphology and uniform physical properties and formed on the GaN crystal substrate is obtained.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE
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