REGROWN SHOTTKY STRUCTURES FOR GAN HEMT DEVICES

Embodiments include but are not limited to apparatuses and systems including a buffer layer, a group III-V layer over the buffer layer, a source contact and a drain contact on the group III-V layer, and a regrown Schottky layer over the group III-V layer, and between the source and drain contacts. T...

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Bibliographische Detailangaben
1. Verfasser: BEAM, III EDWARD A
Format: Patent
Sprache:eng
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Zusammenfassung:Embodiments include but are not limited to apparatuses and systems including a buffer layer, a group III-V layer over the buffer layer, a source contact and a drain contact on the group III-V layer, and a regrown Schottky layer over the group III-V layer, and between the source and drain contacts. The embodiments further include methods for making the apparatuses and systems. Other embodiments may be described and claimed.