DEFECTS INSPECTING APPARATUS AND DEFECTS INSPECTING METHOD

An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for de...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE MASAHIRO, NISHIYAMA HIDETOSHI, OHSHIMA YOSHIMASA, JINGU TAKAHIRO, NAKATA TOSHIHIKO, HAMAMATSU AKIRA, NOGUCHI MINORI, UTO SACHIO
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.