SEMICONDUCTOR CHIP WITH PATTERNED UNDERBUMP METALLIZATION

Various semiconductor chip solder bump and underbump metallization (UBM) structures and methods of making the same are disclosed. In one aspect, a method is provided that includes providing a semiconductor chip that has a conductor pad and a passivation structure over the conductor pad. A first metallic layer is applied on the passivation structure and in electrical contact with the conductor pad. The first metallic layer covers a first portion but not a second portion of the passivation structure. A second metallic layer is applied to the first metallic layer. A polymer layer is applied to the second metallic layer. The polymer layer includes a first opening in alignment with the first metallic layer that exposes a portion of the second layer. A conducting solder barrier layer is applied to the exposed portion of the second metallic layer.