METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING

METHOD AND SYSTEM FOR FEATURE FUNCTION AWARE PRIORITY PRINTING

A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot s...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CALDWELL BRIAN NEAL, RANKIN JED H, NASH STEVEN C, GALLAGHER EMILY E. F
Format: Patent
Sprache:eng
Schlagworte:
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Beschreibung
Zusammenfassung:A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot size and passing fractured mask design data to a write tool. Additionally, the method includes writing one or more non-critical shapes according to one or more time-saving rules.