Method for Forming a Ruthenium Film

Methods for forming ruthenium films and semiconductor devices such as capacitors that include the films are provided.

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Bibliographische Detailangaben
Hauptverfasser:	GEALY DAN, BHAT VISHWANATH, ANTONOV VASSIL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Methods for forming ruthenium films and semiconductor devices such as capacitors that include the films are provided.