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A transistor including a source; a drain; a gate region, the gate region including a gate; an island; and a gate oxide, wherein the gate oxide is positioned between the gate and the island; and the gate and island are coactively coupled to each other; and a source barrier and a drain barrier, wherei...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JIN INSIK, SIEGERT MARKUS, TIAN WEI, VAITHYANATHAN VENUGOPALAN, BEDOYA CEDRIC
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A transistor including a source; a drain; a gate region, the gate region including a gate; an island; and a gate oxide, wherein the gate oxide is positioned between the gate and the island; and the gate and island are coactively coupled to each other; and a source barrier and a drain barrier, wherein the source barrier separates the source from the gate region and the drain barrier separates the drain from the gate region.