Cleaning Compound and Method and System for Using the Cleaning Compound

A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50%...

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Hauptverfasser: KOROLIK MIKHAIL, RAVKIN MICHAEL, FREER ERIK M, DE LARIOS JOHN M, REDEKER FRED C, IICHENKO KATRINA MIKHAY
Format: Patent
Sprache:eng
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Zusammenfassung:A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided.