DAMPING DEVICE

A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106). Using a set of at least two replaceable spacer elements (94; 94′) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94′) can be removed or a spacer element (94; 94′) can be added while the coupling of the first coupling end (46; 46′) to the carrying structure (38; 38′) and the coupling of the second coupling end (54a; 54′) to the optical element (34; 34′) are maintained. As an alternative, a hexapod system having six hexapod supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) is provided, in which each supporting structure (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) comprises at least one monolithic articulation (60, 76; 60′, 76′). By means of a set of at least two replaceable spacer elements (94), the working length of at least one of the six supporting structures (42, 44, 46, 94; 42′, 44′, 46′, 94′, 106) can be adjusted. A method for aligning an optical element in semiconductor clean rooms or in a vacuum by means of a hexapod system is furthermore provided.