ROLL TO ROLL PATTERNED DEPOSITION PROCESS AND SYSTEM

A continuous roll-to-roll apparatus for providing a patterned deposit of a material onto a moving substrate web includes a payout station for feeding out a substrate web, a take-up station for taking up the substrate web, and a web transport system for advancing the web through the apparatus from th...

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Bibliographische Detailangaben
Hauptverfasser:	CANNELLA VINCENT, CRUCET RAYMOND
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING
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Beschreibung
Zusammenfassung:	A continuous roll-to-roll apparatus for providing a patterned deposit of a material onto a moving substrate web includes a payout station for feeding out a substrate web, a take-up station for taking up the substrate web, and a web transport system for advancing the web through the apparatus from the payout station to the take-up station. The apparatus includes at least one deposition station disposed between the payout station and the take-up station, and the deposition station is operative to deposit a material onto the web as it moves therethrough. The apparatus includes a masking system associated with a deposition station. The masking system is operative to dispose a deposition mask in registry with a portion of the length of the moving web. The deposition mask is comprised of a plurality of filaments which are aligned with the longitudinal axis of the web. The filaments are spaced from one another in a direction transverse to the longitudinal axis, and the masking system is further operative to move the filaments along the longitudinal axis, and the filaments function to selectively mask longitudinal portions of the moving web so as to prevent the deposition of material thereupon. Also disclosed are methods for utilizing the system.