INLINE PROCESS CONTROL STRUCTURES

A method for process control is disclosed. The method includes performing an etching process on a semiconductor substrate forming a structure and a test structure having a pattern and a releasing mechanism coupled to the pattern; and monitoring the pattern of the test structure to determine whether...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHENG CHUN-REN, TAI WENUAN, LIANG KAIIH
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method for process control is disclosed. The method includes performing an etching process on a semiconductor substrate forming a structure and a test structure having a pattern and a releasing mechanism coupled to the pattern; and monitoring the pattern of the test structure to determine whether the etching process is complete.