APPARATUS WITH MULTIPLE HEATING SYSTEMS FOR IN-LINE THERMAL TREATMENT OF SUBSTRATES

The present invention relates to in-line equipment used to process substrates. In some applications, the equipment is used in the in-line manufacture PV cells or modules. In some embodiments, a heating system is provided that comprises a plurality of heating technologies for the heat treatment of su...

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Bibliographische Detailangaben
Hauptverfasser:	REYNOLDS REESE, HELMS, JR. AUBREY L, NILSSON PONTUS K.H, JOHNSON JAMES T, PECK KEVIN B
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS BLASTING CHEMISTRY CRYSTAL GROWTH DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING KILNS LIGHTING MECHANICAL ENGINEERING METALLURGY OPEN SINTERING OR LIKE APPARATUS OVENS PERFORMING OPERATIONS PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL RETORTS SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SPRAYING OR ATOMISING IN GENERAL TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL WEAPONS
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Beschreibung
Zusammenfassung:	The present invention relates to in-line equipment used to process substrates. In some applications, the equipment is used in the in-line manufacture PV cells or modules. In some embodiments, a heating system is provided that comprises a plurality of heating technologies for the heat treatment of substrates wherein a first heating system is used to rapidly raise the substrate temperature to the desired set point and a second heating system is used to maintain the substrate at the temperature set point throughout the thermal treatment process.