HIGH STABILITY REFLECTIVE ELEMENT MOUNT

A beam director (360) for directing a beam (356, 358) comprises a director base (464), a reflective element (462), a base pivot (474A), an element pivot (470), and a first element fastener (468A). The director base (464) is positioned adjacent to a mounting base (226). A first interface between the...

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Hauptverfasser: STEELE BRADLEY CHARLES, LEWIS MARK R, WALLACE KEN, SENSIBAUGH JASON, PUSHKARSKY MICHAEL, ARNONE DAVID F, GATES GREGORY HUNT, LONG BRIAN JACOB
Format: Patent
Sprache:eng
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Zusammenfassung:A beam director (360) for directing a beam (356, 358) comprises a director base (464), a reflective element (462), a base pivot (474A), an element pivot (470), and a first element fastener (468A). The director base (464) is positioned adjacent to a mounting base (226). A first interface between the director base (464) and the mounting base (226) is in a first interface plane that is orthogonal to a first axis. The base pivot (474A) provides a base pivot axis for selectively rotating the director base (464) and the reflective element (462) relative to the mounting base (226) about the first axis. The element pivot (470) guides the rotation of the reflective element (462) relative to the director base (464) about a second axis that is orthogonal to the first axis. The first element fastener (468A) is selectively movable between a locked position and an unlocked position to selectively inhibit rotation of the reflective element (462) relative to the director base (464) about the second axis. Additionally, the first element fastener (468A) moves along an axis that is orthogonal to the second axis during movement between the unlocked position and the locked position.