SYSTEM AND METHOD FOR MEASURING X-RAY BEAM PROFILE USING AN AREA DETECTOR

The claimed subject matter describes a novel technique to measure the beam profile using an area detector. In one embodiment, a set of one-dimensional beam profile measurements is performed by taking two images under the same source conditions but at two different positions of the detector, with eac...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SUN MINGSHAN, STAR-LACK JOSH, THIEME-MARTI STEFAN JO, MORF DANIEL, VIRSHUP GARY
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The claimed subject matter describes a novel technique to measure the beam profile using an area detector. In one embodiment, a set of one-dimensional beam profile measurements is performed by taking two images under the same source conditions but at two different positions of the detector, with each position of the detector shifted by a certain distance in the direction corresponding to the direction of the one-dimensional profile measurement. In further embodiments, a set of two-dimensional beam profile measurements is achieved by determining a second set of one-dimensional profiles from the same sampling points in a second direction and building a two-dimensional map of the beam profile by correlating the first one-dimensional profile measurement with the second one-dimensional profile measurement.