SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME

Provided are a semiconductor device and a method of forming the same. The method may include forming a gate dielectric layer including a plurality of elements on a substrate; supplying a specific element to the gate dielectric layer; forming a product though reacting the specific element with at lea...

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Bibliographische Detailangaben
Hauptverfasser: HYUN SANGJIN, HONG HYUNG-SEOK, CHO HAGJU, SHIN YUGYUN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided are a semiconductor device and a method of forming the same. The method may include forming a gate dielectric layer including a plurality of elements on a substrate; supplying a specific element to the gate dielectric layer; forming a product though reacting the specific element with at least one of the plurality of elements; and removing the product.