HYDROGEN RADICAL GENERATOR

A method of reducing contamination generated by a hydrogen radical generator and deposited on an optical element of a lithographic apparatus includes passing molecular hydrogen over a first part of a metal filament of the hydrogen radical generator, the first part including a metal-oxide, when the t...

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Bibliographische Detailangaben
Hauptverfasser:	SCHASFOORT GERARD FRANS JOZEF, HUIJSER TIMO, KEMPEN ANTONIUS THEODORUS WILHELMUS, STORM ARNOLDUS JAN, VANNEER ROELAND NICOLAAS MARIA, HUIJBREGTSE JEROEN MARCEL, JONKER WOUTER ANDRIES, TE SLIGTE EDWIN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A method of reducing contamination generated by a hydrogen radical generator and deposited on an optical element of a lithographic apparatus includes passing molecular hydrogen over a first part of a metal filament of the hydrogen radical generator, the first part including a metal-oxide, when the temperature of the first part of the metal filament is at a reduction temperature less than or equal to an evaporation temperature of the metal-oxide.