EXPOSURE CONTROL SYSTEM AND EXPOSURE CONTROL METHOD

According to one embodiment, an exposure control system includes an overlap judgment unit that judges whether a position of a foreign matter that adheres to a back surface of a photomask overlaps a position of a chuck that holds the photomask when the photomask is held by the chuck, and an exposure...

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Bibliographische Detailangaben
1. Verfasser:	KYOH SUIGEN
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	According to one embodiment, an exposure control system includes an overlap judgment unit that judges whether a position of a foreign matter that adheres to a back surface of a photomask overlaps a position of a chuck that holds the photomask when the photomask is held by the chuck, and an exposure decision unit that decides to hold the photomask by the chuck and perform exposure, when it has been determined that the position of the foreign matter does not overlap the position of the chuck.