SEMICONDUCTOR DEVICE WITH GATE-UNDERCUTTING RECESSED REGION

A semiconductor device comprises a gate structure on a semiconductor substrate and a recessed region in the semiconductor substrate. The recessed region has a widest lateral opening that is near a top surface of the semiconductor substrate. The widest lateral opening undercuts the gate structure.

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Bibliographische Detailangaben
Hauptverfasser: HURD TRACE Q, KOONTZ ELISABETH MARLEY, ROTONDARO ANTONIO LUIS PACHECO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device comprises a gate structure on a semiconductor substrate and a recessed region in the semiconductor substrate. The recessed region has a widest lateral opening that is near a top surface of the semiconductor substrate. The widest lateral opening undercuts the gate structure.