SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM

A substrate processing apparatus includes a substrate transit table configured to mount thereon a plurality of substrates; a substrate processing chamber configured to process the substrate one by one; a substrate transfer device capable of loading the substrate into the substrate processing chamber...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: UEDA ISSEI, KIMOTO KOUJI, YOSHIDA MASAHIRO, MURATA AKIRA, KURODA OSAMU
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A substrate processing apparatus includes a substrate transit table configured to mount thereon a plurality of substrates; a substrate processing chamber configured to process the substrate one by one; a substrate transfer device capable of loading the substrate into the substrate processing chamber from the substrate transit table and unloading the substrate from the substrate processing chamber to the substrate transit table; and N number of (N is an integer equal to or larger than 3) substrate holding devices provided at the substrate transfer device and configured to hold the substrates one by one. Here, a multiplicity of (2 to N−1 number of) substrates are concurrently held by 2 to N−1 number of substrate holding devices among the N number of substrate holding devices and one substrate is loaded into the substrate processing chamber.