SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

This invention provides a semiconductor device having a semiconductor element that has low-resistance and a stable contact connection, even when the wiring is connected from the side of the single-crystal silicon layer on which the impurity concentration is lower. This invention provides a semicondu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAKAFUJI YUTAKA, FUKUSHIMA YASUMORI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:This invention provides a semiconductor device having a semiconductor element that has low-resistance and a stable contact connection, even when the wiring is connected from the side of the single-crystal silicon layer on which the impurity concentration is lower. This invention provides a semiconductor device comprising, on a substrate, a semiconductor device having a single-crystal semiconductor film and a wiring connected to the single-crystal semiconductor film, and in the single-crystal semiconductor film, an impurity concentration on one surface side is different from an impurity concentration on another surface side, the wiring being connected to the surface side on which the impurity concentration is lower, the resistivity of a region of the single-crystal semiconductor film to which the wiring is connected being no less than 1 μ cm and no more than 0.01 cm.