FIELD TRANSISTORS FOR ELECTROSTATIC DISCHARGE PROTECTION AND METHODS FOR FABRICATING THE SAME

A field transistor for electrostatic discharge (ESD) protection and method for making such a transistor is described. The field transistor includes a gate conductive layer pattern formed on a field oxide layer. Since the gate conductive layer pattern is formed on the field oxide layer, a thin gate i...

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Bibliographische Detailangaben
Hauptverfasser: KIM JONG-HWAN, RYU JUN-HYEONG, KANG TAEG-HYUN
Format: Patent
Sprache:eng
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Zusammenfassung:A field transistor for electrostatic discharge (ESD) protection and method for making such a transistor is described. The field transistor includes a gate conductive layer pattern formed on a field oxide layer. Since the gate conductive layer pattern is formed on the field oxide layer, a thin gate insulating layer having a high possibility of insulation breakdown is not used. To form an inversion layer for providing a current path between source and drain regions, a field oxide layer is interposed to form low concentration source and drain regions overlapped by the gate conductive layer pattern.