METHOD OF CONTROLLING AN INDENTATION DEPTH OF AN ELECTRODE INTO A METAL SUBSTRATE DURING WELDING

A method of controlling an indentation depth of an electrode into a metal substrate during formation of a weld includes selecting a weld force, current, duration, minimum indentation depth, and maximum indentation depth, contacting the substrate with the electrode to apply the force to the substrate, supplying the current to the electrode to initiate formation of the weld according to a first condition in which the depth is less than the minimum, a second condition in which the depth is greater than or equal to the minimum and less than or equal to the maximum, and a third condition in which the depth is greater than the maximum, and comparing the depth, minimum, and maximum. For the first condition, duration is changed. For the second condition, each of the force, current, and duration is maintained until the weld is substantially formed. For the third condition, current ceases to be supplied.