METHOD FOR DETERMINING AN OVERALL LEAKAGE RATE OF A VACUUM SYSTEM AND VACUUM SYSTEM

An overall leakage rate of a vacuum system which can be operated continuously or cyclically is determined. The vacuum system includes at least one process chamber (10) and a pumping device (16) connected to the process chamber (10). In a cyclical leakage rate determination technique, the following s...

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Hauptverfasser:	PALTEN THOMAS, EHRENSPERGER DAMIAN, WALTER GERHARD WILHELM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MEASURING METALLURGY PERFORMING OPERATIONS PHYSICS SPRAYING OR ATOMISING IN GENERAL SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR TRANSPORTING
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Beschreibung
Zusammenfassung:	An overall leakage rate of a vacuum system which can be operated continuously or cyclically is determined. The vacuum system includes at least one process chamber (10) and a pumping device (16) connected to the process chamber (10). In a cyclical leakage rate determination technique, the following steps are taken: suppressing a process gas feed to the process chamber (10), feeding a carrier gas to the process chamber (10), conveying the carrier gas and a leakage gas using the pumping device (16), measuring an amount of a gas component in the pumped gas, and determining the overall leakage rate of the vacuum system based on the measured amount of the gas component.