METHOD OF MAKING 3-DIMENSIONAL NEURAL PROBES HAVING ELECTRICAL AND CHEMICAL INTERFACES
A method of fabricating a three-dimensional neural probe includes the steps of: growing thermal oxide layer; depositing a layer of Au/Cr on the thermal oxide layer; patterning the layer of Au/Cr; depositing a layer of parylene C; etching the thermal oxide layer to release a plurality of islands; and...
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Zusammenfassung: | A method of fabricating a three-dimensional neural probe includes the steps of: growing thermal oxide layer; depositing a layer of Au/Cr on the thermal oxide layer; patterning the layer of Au/Cr; depositing a layer of parylene C; etching the thermal oxide layer to release a plurality of islands; and folding the islands onto one another in stacked relation. The layer of Au/Cr is formed by an evaporation process, and the layer of parylene C is deposited to a thickness of approximately 8 μm. DRIE is used to perform the etching, and HF is used to remove the thermal oxide. A spacer is disposed intermediate of two of the islands. |
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