APPARATUS FOR MODIFYING ELECTRON BEAM ASPECT RATIO FOR X-RAY GENERATION

An apparatus for modifying an aspect ratio of an electron beam to form a focal spot having a desired size and aspect ratio on a target anode is disclosed. The apparatus includes an emitter element configured to generate an electron beam having a first aspect ratio shape and an extraction electrode p...

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Bibliographische Detailangaben
Hauptverfasser: LEMAITRE SERGIO, ZOU YUN, FRONTERA MARK ALAN, ZAVODSZKY PETER ANDRAS, VERMILYEA MARK E
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An apparatus for modifying an aspect ratio of an electron beam to form a focal spot having a desired size and aspect ratio on a target anode is disclosed. The apparatus includes an emitter element configured to generate an electron beam having a first aspect ratio shape and an extraction electrode positioned adjacent to the emitter element to extract the electron beam out therefrom, the extraction electrode including an opening therethrough. The apparatus also includes at least one shaping electrode positioned to receive the electron beam after passing through the extraction electrode, the shaping electrode defining a non-circular aperture therein and being configured to provide at least one of shaping and focusing of the electron beam to have a second aspect ratio shape different from the first aspect ratio shape so as to form a focal spot having a desired size and aspect ratio on a target anode.