WAFER CLEANING DEVCIE AND METHOD THEREOF

WAFER CLEANING DEVCIE AND METHOD THEREOF

A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIU CHIN-KUANG, WANG CHININ, LU YAN-YI, TUNG KUEIANG, LEE MING-HSIN, YU CHENG-HUNG, CHUANG WEI-HONG, TSAI HSIN-TING
Format: Patent
Sprache:eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Beschreibung
Zusammenfassung:A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.