REFLECTIVE IMAGING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE

An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system...

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1. Verfasser: ONO TAKURO
Format: Patent
Sprache:eng
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Zusammenfassung:An imaging optical system of the far pupil type, which is applicable to an exposure apparatus, is provided with six reflecting mirrors and forms an image of a first plane on a second plane. An incident pupil of the imaging optical system is positioned on a side opposite to the imaging optical system with the first plane intervening therebetween. A condition of −14.3