PATTERN PROCESSES AND DEVICES THEREOF

An apparatus may include a nano-particle layer and/or a linking agent layer. An apparatus may include a nano-particle layer bonded to a linking agent layer. An apparatus may include a substantially smooth surface. An apparatus may include a nano-particle layer and/or a linking agent layer which may...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BINGAMAN ADAM, LALLI JENNIFER HOYT, HARRISON WILLIAM
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:An apparatus may include a nano-particle layer and/or a linking agent layer. An apparatus may include a nano-particle layer bonded to a linking agent layer. An apparatus may include a substantially smooth surface. An apparatus may include a nano-particle layer and/or a linking agent layer which may be electrostatically etched to form a precise etched portion. An apparatus may have a precise etched portion including a pattern, for example a coil print pattern having a bend. An apparatus may include a nano-particle layer and/or a linking agent layer bonded to a shape memory layer. An apparatus may include a relatively even distribution of heat and/or current, and/or a predetermined heat and/or current path. A method may include forming a nano-particle layer and/or a linking agent layer. A method may include electrostatically etching a nano-particle layer and/or a linking agent layer.