DIAMOND APPARATUS AND METHOD OF MANUFACTURE

A method of manufacturing a diamond apparatus includes forming an insulating layer on a surface of a substrate, forming a masking layer on a surface of the insulating layer, and forming a photoresist layer on a surface of the masking layer. A portion of the photoresist layer is cross-linked through...

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Bibliographische Detailangaben
Hauptverfasser: SABENS DAVID M, HALPERN JEFFREY M, HAYMAN CLIFFORD C, MARTIN HEIDI B, HESS ALLISON E, ZORMAN CHRISTAIN A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of manufacturing a diamond apparatus includes forming an insulating layer on a surface of a substrate, forming a masking layer on a surface of the insulating layer, and forming a photoresist layer on a surface of the masking layer. A portion of the photoresist layer is cross-linked through exposure to light, leaving a portion of the photoresist layer non-cross-linked. The non-cross-linked portion of the photoresist layer is removed from the masking layer, thus exposing a portion of the masking layer. The method further includes removing the exposed masking layer portion. Any remaining portion of the cross-linked photoresist layer is also removed, resulting in the formation of a patterned masking layer extending from the insulation layer. Diamond material is seeded onto the patterned masking layer and an exposed portion of the insulation layer. The masking layer is removed, resulting in a patterned diamond apparatus extending from the insulating layer