Twin Internal Ion Source For Particle Beam Production With A Cyclotron

Twin Internal Ion Source For Particle Beam Production With A Cyclotron

The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advant...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GHYOOT MICHEL, KLEEVEN WILLEM, ABS MICHEL
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator GHYOOT MICHEL
KLEEVEN WILLEM
ABS MICHEL
description The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advantageously, the cyclotron is further characterized by an optimized close geometry of the different elements within the central region of the cyclotron. The cyclotron of the invention may be further characterized by an adaptation and optimization of the shape of first and second internal ion source to avoid particle losses during the first turn of acceleration. The cyclotron may be further characterized by an adaptation and optimization of the shape of the counter-Dee electrode assembly and possibly the Dee-electrode assembly in order to improve the acceleration field in-between the gaps.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2011068717A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2011068717A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2011068717A13</originalsourceid><addsrcrecordid>eNrjZHALKc_MU_DMK0ktykvMUfDMz1MIzi8tSk5VcMsvUghILCrJTM5JVXBKTcxVCCjKTylNLskEqgnPLMlQcFRwrkzOyS8pys_jYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoaGBmYW5obmjobGxKkCAGyOM2o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Twin Internal Ion Source For Particle Beam Production With A Cyclotron</title><source>esp@cenet</source><creator>GHYOOT MICHEL ; KLEEVEN WILLEM ; ABS MICHEL</creator><creatorcontrib>GHYOOT MICHEL ; KLEEVEN WILLEM ; ABS MICHEL</creatorcontrib><description>The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advantageously, the cyclotron is further characterized by an optimized close geometry of the different elements within the central region of the cyclotron. The cyclotron of the invention may be further characterized by an adaptation and optimization of the shape of first and second internal ion source to avoid particle losses during the first turn of acceleration. The cyclotron may be further characterized by an adaptation and optimization of the shape of the counter-Dee electrode assembly and possibly the Dee-electrode assembly in order to improve the acceleration field in-between the gaps.</description><language>eng</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110324&amp;DB=EPODOC&amp;CC=US&amp;NR=2011068717A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20110324&amp;DB=EPODOC&amp;CC=US&amp;NR=2011068717A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GHYOOT MICHEL</creatorcontrib><creatorcontrib>KLEEVEN WILLEM</creatorcontrib><creatorcontrib>ABS MICHEL</creatorcontrib><title>Twin Internal Ion Source For Particle Beam Production With A Cyclotron</title><description>The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advantageously, the cyclotron is further characterized by an optimized close geometry of the different elements within the central region of the cyclotron. The cyclotron of the invention may be further characterized by an adaptation and optimization of the shape of first and second internal ion source to avoid particle losses during the first turn of acceleration. The cyclotron may be further characterized by an adaptation and optimization of the shape of the counter-Dee electrode assembly and possibly the Dee-electrode assembly in order to improve the acceleration field in-between the gaps.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHALKc_MU_DMK0ktykvMUfDMz1MIzi8tSk5VcMsvUghILCrJTM5JVXBKTcxVCCjKTylNLskEqgnPLMlQcFRwrkzOyS8pys_jYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBoaGBmYW5obmjobGxKkCAGyOM2o</recordid><startdate>20110324</startdate><enddate>20110324</enddate><creator>GHYOOT MICHEL</creator><creator>KLEEVEN WILLEM</creator><creator>ABS MICHEL</creator><scope>EVB</scope></search><sort><creationdate>20110324</creationdate><title>Twin Internal Ion Source For Particle Beam Production With A Cyclotron</title><author>GHYOOT MICHEL ; KLEEVEN WILLEM ; ABS MICHEL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2011068717A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>GHYOOT MICHEL</creatorcontrib><creatorcontrib>KLEEVEN WILLEM</creatorcontrib><creatorcontrib>ABS MICHEL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GHYOOT MICHEL</au><au>KLEEVEN WILLEM</au><au>ABS MICHEL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Twin Internal Ion Source For Particle Beam Production With A Cyclotron</title><date>2011-03-24</date><risdate>2011</risdate><abstract>The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advantageously, the cyclotron is further characterized by an optimized close geometry of the different elements within the central region of the cyclotron. The cyclotron of the invention may be further characterized by an adaptation and optimization of the shape of first and second internal ion source to avoid particle losses during the first turn of acceleration. The cyclotron may be further characterized by an adaptation and optimization of the shape of the counter-Dee electrode assembly and possibly the Dee-electrode assembly in order to improve the acceleration field in-between the gaps.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2011068717A1
source esp@cenet
subjects ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
title Twin Internal Ion Source For Particle Beam Production With A Cyclotron
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-07T19%3A31%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GHYOOT%20MICHEL&rft.date=2011-03-24&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2011068717A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true