Twin Internal Ion Source For Particle Beam Production With A Cyclotron

The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advant...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: GHYOOT MICHEL, KLEEVEN WILLEM, ABS MICHEL
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a cyclotron including two internal ion sources for the production of the same particles. The second ion source can be used as a spare ion source which strongly increases the uptime and the reliability of the cyclotron and reduces the maintenance interventions. Advantageously, the cyclotron is further characterized by an optimized close geometry of the different elements within the central region of the cyclotron. The cyclotron of the invention may be further characterized by an adaptation and optimization of the shape of first and second internal ion source to avoid particle losses during the first turn of acceleration. The cyclotron may be further characterized by an adaptation and optimization of the shape of the counter-Dee electrode assembly and possibly the Dee-electrode assembly in order to improve the acceleration field in-between the gaps.