SEMICONDUCTOR SUBSTRATE SURFACE PREPARATION METHOD

The invention relates to a method for preparing a surface of a semiconductor substrate by oxidizing the surface of the semiconductor substrate to thereby transform the natural oxide into an artificial oxide and then removing the artificial oxide, in particular to obtain an oxide-free substrate surfa...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	KHALID RADOUANE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	The invention relates to a method for preparing a surface of a semiconductor substrate by oxidizing the surface of the semiconductor substrate to thereby transform the natural oxide into an artificial oxide and then removing the artificial oxide, in particular to obtain an oxide-free substrate surface.