RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES

Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm o...

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Hauptverfasser: JOHNSON RICHARD JOHN, HARROLD GEORGE HILARY, VAN DER WEIJDEN HUGO JACOBUS GERARDUS, LANSBERGEN ROBERT GABRIEL MARIA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.