METHOD FOR TREATING HIGH HYDROPHOBIC SURFACE OF SUBSTRATE

There is provided a method for treating a surface of a substrate, comprising forming a layer, such as a mixed self-assembled monolayer (SAM), on the surface via chemical vapor deposition (CVD) with a CF3-functionalized organic silane and a CH3-functionalized organic silane, wherein the length of a c...

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Bibliographische Detailangaben
Hauptverfasser: CHOI SUNG-HWAN, MOON KI-JEONG, JEON HAE-SANG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:There is provided a method for treating a surface of a substrate, comprising forming a layer, such as a mixed self-assembled monolayer (SAM), on the surface via chemical vapor deposition (CVD) with a CF3-functionalized organic silane and a CH3-functionalized organic silane, wherein the length of a carbon chain of the CH3-functional organic silane is shorter than a carbon chain of the CF3-functionalized organic silane.