Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure Apparatus

In order to determine whether an exposure apparatus is projecting patterns correctly, a marker pattern is used on a mask for printing a specific marker structure onto a substrate. This marker is then measured by an inspection apparatus to determine whether there are errors in exposure-related proper...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VAN ROOY MICHEL FRANCISCUS JOHANNES, HINNEN PAUL CHRISTIAAN, VAN DER HEIJDEN EDDY CORNELIS ANTONIUS, LEEWIS CHRISTIAN MARINUS, QUAEDACKERS JOHANNES ANNA
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHOTOGRAPHY PHYSICS TESTING
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