METHOD FOR MANUFACTURING DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE

A method for manufacturing a display device includes the step of forming a preset basic pattern in a plurality of places on an insulation substrate by exposing and developing a photosensitive material film which is formed on the insulation substrate, wherein the exposure is performed using a direct...

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Bibliographische Detailangaben
Hauptverfasser:	HAYASHI NOBUYASU, TOJO TOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	A method for manufacturing a display device includes the step of forming a preset basic pattern in a plurality of places on an insulation substrate by exposing and developing a photosensitive material film which is formed on the insulation substrate, wherein the exposure is performed using a direct writing exposure device. The exposure is performed using the direct writing exposure device in which the light quantity distribution of the pattern of light formed by the spatial optical modulating element is corrected such that a fluctuation quantity of a size of the basic pattern formed in the plurality of places becomes not more than 0.2 μm.