Glass Flux Assisted Sintering of Chemical Solution Deposited Thin Dielectric Films

A method of making dense dielectrics layers via chemical solution deposition by adding inorganic glass fluxed material to high dielectric constant compositions, depositing the resultant mixture onto a substrate and annealing the substrate at temperatures between the softening point of the inorganic...

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Hauptverfasser: BURN IAN, IHLEFELD JON FREDRICK, SUH SEIGI, MARIA JON-PAUL, BORLAND WILLIAM
Format: Patent
Sprache:eng
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Zusammenfassung:A method of making dense dielectrics layers via chemical solution deposition by adding inorganic glass fluxed material to high dielectric constant compositions, depositing the resultant mixture onto a substrate and annealing the substrate at temperatures between the softening point of the inorganic glass flux and the melting point of the substrate. A method of making a capacitor comprising a dense dielectric layer.