SUBSTRATE SUPPORTING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE SUPPORTING METHOD, CONTROL PROGRAM OF SUBSTRATE SUPPORTING APPARATUS, AND RECORDING MEDIUM

Productivity is improved by ensuring reliability of palette holding and reliability of operations. A substrate supporting apparatus includes a palette on which a substrate is mounted, a palette double-end holding mechanism holding both ends in a diameter direction of the palette while the palette is...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GEN GOSHOKUBO, KAZUYUKI MAJIMA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Productivity is improved by ensuring reliability of palette holding and reliability of operations. A substrate supporting apparatus includes a palette on which a substrate is mounted, a palette double-end holding mechanism holding both ends in a diameter direction of the palette while the palette is in a vertical posture, a palette center holding mechanism rotatably holding a center section of the palette, and a moving mechanism moving an apparatus body, wherein the palette double-end holding mechanism is a mechanism that grips the both ends in the diameter direction of the palette from both sides of a thickness direction, the palette double-end holding mechanism holds the palette during movement, the palette is held by both of the holding mechanisms during delivery from the palette double-end holding mechanism to the palette center holding mechanism, and the palette center holding mechanism rotatably holds the center section of the palette and holding by the palette double-end holding mechanism is released during substrate processing.