ILLUMINATION SURFACES WITH REDUCED LINEAR ARTIFACTS

Illumination surfaces according to the present invention eliminate or at least reduce linear "stitch" artifacts at edges between tiled illumination devices. As a result, light of substantially uniform intensity is emitted across the entire illumination system. This is achieved, in various...

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1. Verfasser: SHANI YOSI
Format: Patent
Sprache:eng
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Zusammenfassung:Illumination surfaces according to the present invention eliminate or at least reduce linear "stitch" artifacts at edges between tiled illumination devices. As a result, light of substantially uniform intensity is emitted across the entire illumination system. This is achieved, in various embodiments, by reflecting, through the gaps between adjacent light-guide elements, light directed through the bottom surfaces of the elements.