LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling...

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Bibliographische Detailangaben
Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA, BADAM VIJAY KUMAR, BRANDS GERT-JAN GERARDUS JOHANNES THOMAS, DE GROOT CASPER RODERIK, JACOBS JOHANNES HENRICUS WILHELMUS, VAN DER HOEVEN JAN CORNELIS, STAVENGA MARCO KOERT, KAMPHUIS MARTIJN HENDRIK, ANSTOTZ DAVID LUCIEN, KNAAPEN THIJS EGIDIUS JOHANNES, PELLENS RUDY JAN MARIA, BRULS RICHARD JOSEPH, VAN DER ZANDEN MARCUS JOHANNES, VERSPAGET COEN CORNELIS WILHELMUS, MAAS RUDOLF ADRIANUS JOANNES
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.