DIRECTIONAL GAS INJECTION FOR AN ION SOURCE CATHODE ASSEMBLY

In an ion implanter, an inert gas is directed at a cathode assembly near an ion source chamber via a supply tube. The inert gas is provided with a localized directional flow toward the cathode assembly to reduce unwanted concentrations of cleaning or dopant gases introduced into the ion source chamb...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SINCLAIR FRANK, TWISS DAVID J, PLATOW WILHELM P, PEREL ALEXANDER S, COBB ERIC R, CAMPBELL CHRIS, CHANEY CRAIG R, KOO JOHN BON-WOONG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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