INTEGRATED CIRCUIT DEVICE AND METHOD

INTEGRATED CIRCUIT DEVICE AND METHOD

An integrated circuit device includes a semiconductor chip with a metallization layer on the chip. A gas-phase deposited insulation layer is disposed on the metallization layer.

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Bibliographische Detailangaben
Hauptverfasser: MAHLER JOACHIM, GALESIC IVAN, BEHRENS THOMAS
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An integrated circuit device includes a semiconductor chip with a metallization layer on the chip. A gas-phase deposited insulation layer is disposed on the metallization layer.