Charged particle beam profile measurement
According to an embodiment, an apparatus for measuring the uniformity of a beam of charged particles at an exposure location includes a plurality of Faraday cups, each cup including an electrometer for determining the current collected by said cup, at least one multi-channel low current scanner card...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | According to an embodiment, an apparatus for measuring the uniformity of a beam of charged particles at an exposure location includes a plurality of Faraday cups, each cup including an electrometer for determining the current collected by said cup, at least one multi-channel low current scanner card electrically coupled to the electrometers, a processor electrically coupled to said at least one scanner card, computational analysis software for receiving signals from said processor and calculating beam parameters, and display software for generating a graphical representation of the beam parameters calculated by said computational analysis software. |
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